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Characterization of Enhancement AlInN/GaN Hemts using Partial P-Type GaN Gate

Dilip Jaiswal1 , Nandkishor Chavan2 , Hemant Pardeshi3 , Swati Sharma4

1 Dept. of Electronics and Telecommunication, Jodhpur National University, Jodhpur, India.
2 Dept. of Electronics and Telecommunication, Jodhpur National University, Jodhpur, India.
3 Dept. of Electronics and Telecommunication, Jodhpur University, Kolkata, India.
4 Dept. of Electronics and Telecommunication, Jodhpur National University, Jodhpur, India.

Correspondence should be addressed to: pardeshi.ju@gmail.com.


Section:Research Paper, Product Type: Journal
Vol.5 , Issue.3 , pp.95-98, Jun-2017

Online published on Jun 30, 2017


Copyright © Dilip Jaiswal, Nandkishor Chavan, Hemant Pardeshi, Swati Sharma . This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.
 

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IEEE Style Citation: Dilip Jaiswal, Nandkishor Chavan, Hemant Pardeshi, Swati Sharma, “Characterization of Enhancement AlInN/GaN Hemts using Partial P-Type GaN Gate,” International Journal of Scientific Research in Network Security and Communication, Vol.5, Issue.3, pp.95-98, 2017.

MLA Style Citation: Dilip Jaiswal, Nandkishor Chavan, Hemant Pardeshi, Swati Sharma "Characterization of Enhancement AlInN/GaN Hemts using Partial P-Type GaN Gate." International Journal of Scientific Research in Network Security and Communication 5.3 (2017): 95-98.

APA Style Citation: Dilip Jaiswal, Nandkishor Chavan, Hemant Pardeshi, Swati Sharma, (2017). Characterization of Enhancement AlInN/GaN Hemts using Partial P-Type GaN Gate. International Journal of Scientific Research in Network Security and Communication, 5(3), 95-98.

BibTex Style Citation:
@article{Jaiswal_2017,
author = {Dilip Jaiswal, Nandkishor Chavan, Hemant Pardeshi, Swati Sharma},
title = {Characterization of Enhancement AlInN/GaN Hemts using Partial P-Type GaN Gate},
journal = {International Journal of Scientific Research in Network Security and Communication},
issue_date = {6 2017},
volume = {5},
Issue = {3},
month = {6},
year = {2017},
issn = {2347-2693},
pages = {95-98},
url = {https://www.isroset.org/journal/IJSRNSC/full_paper_view.php?paper_id=277},
publisher = {IJCSE, Indore, INDIA},
}

RIS Style Citation:
TY - JOUR
UR - https://www.isroset.org/journal/IJSRNSC/full_paper_view.php?paper_id=277
TI - Characterization of Enhancement AlInN/GaN Hemts using Partial P-Type GaN Gate
T2 - International Journal of Scientific Research in Network Security and Communication
AU - Dilip Jaiswal, Nandkishor Chavan, Hemant Pardeshi, Swati Sharma
PY - 2017
DA - 2017/06/30
PB - IJCSE, Indore, INDIA
SP - 95-98
IS - 3
VL - 5
SN - 2347-2693
ER -

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Abstract :
This work attempts to characterize the Enhancement mode (E-mode) AlInN/GaN HEMT devices implemented using p-GaN gate for getting positive threshold voltage (Vt). The device channel consists of a lattice-matched wideband Al0.83In0.17N and narrowband GaN layers, along with p-GaN layer below the E-mode device. The 2D Sentaurus TCAD simulation is done using the hydrodynamic model. The simulation model is calibrated with the initially published experimental result. A comprehensive, quantitative investigation of transfer characteristics, transconductance, gate capacitance, gate leakage and RF gain for E-mode devices is done. The E-mode device exhibit a Vt of + 1.0 V. This new device exhibit almost similar transconductance characteristics. The E-mode device shows lower off-state leakage current, higher ION/IOFF ratio and lower SS. These results demonstrate the feasibility for fabricating an E-mode AlInN/GaN HEMT device which is extremely desirable for high speed and high-frequency applications.

Key-Words / Index Term :
Enhancement mode (E-mode), HEMT, p-GaN, AlInN/GaN

References :
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